Dielectric insert tool

The program can play a continuous animation of the sweep. Fixed sheet charges can be placed in any dielectric layer at a user specified distance into the dielectric. Resulting shifts in device parameters and energy levels are easy to observe. By modeling different dielectric stacks, device parameters can be calculated.

Demonstrated here is a comparison of three different stacks for possible application to NVM. The shield 30 has a circular recess 32 therein defined by the inwardly facing inner edge of an annular rim The insert 40 nests in the recess An annular shoulder or step 35 lies inwardly of the rim 33 , which allows the insert 40 to be supported with a space between the insert 40 and the shield 30 , as illustrated in FIG.

A pair of channels 34 are formed through the rim 33 of the shield The channels 34 communicate with spaces formed by respective cut-off portions 41 of the insert The cut-off portions 41 allow the space between the insert 40 and the dielectric window 17 to be pumped to vacuum to avoid a pressure gradient across the insert 40 that could crack it.

In this arrangement, typically the window 17 is sealed around its edges to the rim of an opening in the wall of the chamber. Alternatively, as shown in FIG.

The dielectric window 17 a may be provided with an O-ring or other seal 37 , and sealed to the shield 30 a with seal 38 to seal a space between the window 17 a and the shield 30 a that contains the insert The protective insert [] 40 is not attached to or in contact with ceramic window 17 , 17 a thereby avoiding direct thermal contact between the insert 40 and the window 17 , 17 a.

The insert 40 is placed in recess on the top side of deposition shield. With this arrangement, even an accidental break of the protective insert 40 will not cause failure of plasma source since the vacuum will not be lost to the atmosphere as in the case of a dielectric window failure. To improve further thermal insulation between the insert 40 and the window 17 , 17 a , a gap is maintained of approximately 1 mm between the protective insert 40 and deposition shield 30 , as shown in FIG.

The shoulder 35 around the recess 32 provides an additional recess in deposition shield 30 that creates a stepwise surface on deposition shield The shape of protective insert 40 allows for the gas in the space between protective insert 40 and dielectric window 17 , 17 a to be pumped out of the chamber, for example, through the shallow channels 34 machined in deposition shield 30 and through openings 41 provided by the shape of the protective insert itself FIG.

The above described structure provides several advantages. First, cost savings are realized because the protective insert reduces the need for the machined ceramic window [] 17 to be replaced or cleaned due to premature contamination, which, because of sealing surfaces that must be machined on the window 17 , is costly. In the case of an AlN window, this represents significant cost savings. The invention also provides other material cost savings.

For example, the protected window [] 17 can be re-used, since it is not significantly contaminated by sputtered process products. Furthermore, a window 17 protected by a shield 40 does not need to be aggressively cleaned, so sensitive sealing surfaces will not be damaged, thereby maintaining the original vacuum integrity of the system. Furthermore, such a protective insert [] 40 can be replaced more easily than the robust ceramic window 17 can be removed and cleaned. Hence, a blank silicon wafer can be used as an insert 40 , thereby providing a consumable insert having a much lower cost than the cost of maintaining an unprotected window.

Test and metrology cost savings also results. A contaminated protective insert [] 40 can be used as a sample that will be evaluated after replacement, typically after the lifetime of the target in ionized PVD, or during any maintenance services on the source 50 allowing removal of the protective insert 40 , so that data can be compared on the thickness and composition of deposited contaminated layer.

The standard semiconductor metrology instrumentation can be used for such evaluation since the shape and dimensions of protective insert 40 are consistent with semiconductor substrates. Obtained data on thickness and composition of the layer provides feedback to a manufacturer of semiconductors and of the processing apparatus 10 and may be used for continuous improvements of the plasma source and the processes performed therein. The protective insert 40 can be used also in other plasma processing systems that do not produce conductive coatings.

In such case, a replaceable protective insert 40 reduces the time required for cleaning the chamber and the chamber cleaning frequency. While the above description and accompanying drawings set forth various embodiments of the invention, it will be apparent to those skilled in the art that additions and modifications may be made without departing from the principles of the invention.

Accordingly, []. What is claimed is: 1. A method of protecting a dielectric window in the wall of a plasma processing chamber from deposits of material from within the processing chamber in which a semiconductor wafer is being processed, the method comprising: providing a replaceable wafer of the same material as the semiconductor wafer being processed inside of the chamber and replaceably mounted in close proximity to the window so as to protect the window from deposits of material from within the chamber.

The method of claim 1 wherein: a slotted shield is provided inside of the chamber adjacent the window; and. A method of protecting a dielectric window, in the wall of a plasma processing chamber through which energy is inductively coupled from an antenna outside of the chamber into a plasma within the chamber, from deposits of material from the processing chamber through slots in a protective shield that is spaced from the window inside of the chamber, the method comprising: providing a replaceable dielectric insert between the window and the shield.

The method of claim 4 wherein a semiconductor wafer is being processed in the chamber and wherein: the providing of the replaceable dielectric insert includes providing an insert that is compatible with the processing of the semiconductor wafer being processed inside of the chamber.

The method of claim 4 wherein a semiconductor wafer is being processed in the chamber and wherein: the providing of the replaceable dielectric insert includes providing an insert in the form of a wafer of the same material as the semiconductor wafer being processed inside of the chamber.

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The housing can be mated with the mating connector of an electrical component at the mating interface to electrically connect the electrical component to the server. The terminating segments of the electrical contacts of drawer connectors are sometimes held within a mounting cavity of the housing a dielectric insert and a metal retention clip.

Specifically, the dielectric insert is first loaded into the mounting cavity of the housing. Thereafter, the metal retention clip is hand-loaded into a contact channel that extends through the dielectric insert, such that the dielectric insert extends around the metal retention clip.

The electrical contact is then inserted into an opening within the metal retention clip such that the metal retention clip extends around the terminating segment of the electrical contact. The metal retention clip includes a plurality of fingers that extend radially inwardly and engage the terminating segment of the electrical contact to retain the electrical contact within the mounting cavity of the housing.

Using the metal retention clip to retain the electrical contact within the mounting cavity is not without disadvantages. In one embodiment, an electrical connector includes a housing having a mating interface and an interior chamber, an electrical contact having a terminating segment and a mating segment, and a dielectric insert held within the interior chamber of the housing.

In another embodiment, an electrical connector includes a housing having a mating interface and an interior chamber, an electrical contact having a terminating segment and a mating segment, and a dielectric insert held within the interior chamber of the housing. The dielectric insert includes a base having a contact channel extending therethrough and resilient fingers extending from the base into the contact channel.

The resilient fingers are spaced apart around a periphery of the terminating segment of the electrical contact. The resilient fingers include free ends that are engaged with the terminating segment of the electrical contact to retain the electrical contact within the interior chamber of the housing such that the mating segment of the electrical contact extends along the mating interface of the housing. The electrical connector 10 includes a housing 12 that holds a plurality of electrical contacts Only some of the electrical contacts 14 are visible in FIG.

More specifically, each electrical contact 14 that is held by the housing 12 may transmit electrical data signals, electrical ground, or electrical power. As will be descried below, the electrical contacts 14 are held by the housing 12 using dielectric inserts 16 having resilient fingers 62 FIGS.

The housing 12 includes a base 20 that extends a length from an end 22 to an opposite end The housing base 20 includes a mating side 26 that extends from the end 22 to the end 24 , and a terminating side 28 that extends from the end 22 to the end In the exemplary embodiment, the terminating side 28 is opposite the mating side Alternatively, the mating side 26 and the terminating side 28 intersect.

The mating side 26 defines a portion of a mating interface 30 at which the electrical connector 10 is configured to be mated with a mating connector not shown. When mated with the mating connector, each of the electrical contacts 14 of the electrical connector 10 is engaged with, and thereby electrically connected to, one or more corresponding electrical contacts not shown of the mating connector.

An electrical connection between the electrical connector 10 and the mating connector can thereby be established by mating the electrical connector 10 and the mating connector together at the mating interface Referring now to FIGS.

Each contact extension 32 extends a length from the mating side 26 of the housing base 20 to a free end The housing 12 includes an interior chamber 36 within which the electrical contacts 14 FIGS.

Each contact extension 32 includes one or more mating cavities 38 that extend through the length of the contact extension The mating cavities 38 define a portion of the interior chamber 36 of the housing As will be described below, each mating cavity 38 holds a mating segment 40 not shown in FIG.

In the exemplary embodiment, the contact extensions 32 include a plurality of contact barrels 32 a and a contact block 32 b. Each contact barrel 32 a includes a cylindrically shaped body that includes a single one of the mating cavities 38 extending therethrough. The contact block 32 b includes a rectangular shaped body that includes a plurality of the mating cavities 38 extending therethrough. Although sixteen are shown, the housing 12 may include any number of the contact extensions 32 , including any number of the contact barrels 32 a and any number of the contact blocks 32 b.

Moreover, each contact extension 32 may include any number of the mating cavities 38 for holding any number of the electrical contacts In addition or alternative to the cylindrical and rectangular shapes shown herein, each contact extension 32 may include any other shape.

As best seen in FIG. The mounting cavities 42 define a portion of the interior chamber 36 of the housing Each mounting cavity 42 extends into the housing base 20 from an open end 44 to a bottom Each mounting cavity 42 is aligned along the length of the housing base 20 with one or more corresponding ones of the contact extensions Accordingly, each mounting cavity 42 is aligned with one or more corresponding mating cavities 38 of the contact extensions One or more openings 48 extend through the bottom 46 of each of the mounting cavities 42 such that each mating cavity 38 fluidly communicates with the corresponding mounting cavity 42 with which the mating cavity 38 is aligned.

As will be described below, each mounting cavity 42 holds a corresponding one of the dielectric inserts 16 FIGS. The dielectric inserts 16 hold terminating segments 50 FIG. Although five are shown, the terminating side 28 of the housing base 20 may include any number of the mounting cavities 42 , each of which may hold any number of the dielectric inserts 16 and any number of the electrical contacts Although shown as including a rectangular shape, each mounting cavity 42 may additionally or alternatively include any other shape.